World's First Affordable, Large Area Desktop Fabrication and Rapid Prototyping Tool
Beam Pen Lithography (BPL)
Innovative Hardware Solution • Custom Software Integration Unified Tool for Constructing & Studying Nanomaterials
The TERA-Fab E series is the first commercial tool for doing Beam Pen Lithography (BPL). This instrument uses arrays with as many as 20,000 independently addressable pens, each with a tiny aperture to pattern surfaces with light. The custom software allows the researcher to rapidly stitch fields together over a 0.5x0.4 cm2 patterning area. Feature size resolution is sub-100 nm. This tool allows one to rapidly prototype electronic and optical devices, fabricate photomasks, and lithographically process photosensitive surfaces at the point-of-use. A clean room is not required.